EUV lithography industrialization progress
This presentation will provide an overview of the industrialization progress of EUV Lithography, including the latest data on imaging, overlay, defectivity and source power/ productivity.
Field performance data of NXE:3300B, NXE:3350B, and NXE:3400B systems will be shown. In addition, the latest performance development information will be presented.
Furthermore, the ASML EUV roadmap will be shown including high-NA and future 0.33NA system enhancements.