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Metrology and Inspection Development in Imec

Metrology and Inspection Development in Imec

Metrology and Inspection Development in Imec

 

If dimensional metrology remains the main method to control processes, new challenges are emerging beyond the traditional increase of sensitivity and throughput: bring LAB metrology in FAB, combine different metrology, etc ... Going forward, is still realistic to rely on our capability to measure always smaller and complex dimensions? There are existing or emerging ways to enable process control through the detection of process deviations.
Inspection is at a turning point from the hardware point of view (Ebeam vs BF) and from the objective point of view (Random and Systematic defects).
Beyond the what to measure, the volume of information required is challenged. How often, how much do we need to measure? How can we sustain large amount of data acquisition, how can we treat this amount of data quickly and efficiently?
Imec is interacting with a large amount of suppliers of our industry. With them, we are exploring the limits of the current metrology capabilities and try to understand how to tackle the future challenges. Imec is also investigating or enabling new techniques through collaboration with universities or internally. This talk will give an overview of metrology activities in imec by showing our recent achievements and the roadmap to future nodes.

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