New Waves: Ready to Enjoy?
The new waves of industry 4.0 is coming and the role of metrology and inspection is getting more and more important to enable it. To enjoy these waves, we need to prepare the new technologies and sources accordingly in a timely manner. With excellent 10 presentations from technology experts, you can get better understanding on MI challenges and solutions we’re facing now and near future and build the strong network with industry leaders.
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Date: Jan 24(Thu), 2019
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Time: 10:00-19:00
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Room: #402, Conference Room (South), COEX
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Language: English and Korean (Simultaneous interpretation will NOT be provided)
Committee
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Chuck Kim (AMETEK Korea)
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Chang Woo Kim (KLA Corporation)
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TK Kim (Semilab Korea)
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Harris Kim (Rudolph Technologies Korea)
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Munhong Ro (DB HiTek)
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Changman Moon (NOVA Measuring Instruments Korea)
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Byong Chon Park (KRISS)
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Hyungwon Yoo (Hitachi High-Technologies Korea)
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Byoung-Ho Lee (SK hynix)
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Suk Woo Martin Lee (Applied Materials Korea)
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Sung Hun Lee (Thermo Fisher Scientific Electron Microscopy Korea)
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Dongchul Ihm (Samsung Electronics)
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Hyunjin Chang (Auros Technology)
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Jason Jeong (Nextin)
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Jaesung Choi (ASML Korea)
Registration Fee
| SEMI Member | Non-Member | Student | |
| Early Bird (by Jan 16) | 200,000 won | 240,000 won | 120,000 won |
| Onsite | 240,000 won | 280,000 won | 150,000 won |
Agenda
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10:00-10:10
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Welcome
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10:10-10:40
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Keynote
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Session 1: Industry 4.0
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10:40-11:10
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A Systematic Approach to Integrate Metrology and Inspection
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11:10-11:40
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Industry Overview of Fast and Intelligent Metrology by S/TEM (CD-TEM)
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11:40-12:10
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12:10-14:00
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Lunch
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14:00-14:30
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14:30-15:00
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15:00-15:20
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Break
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Session 2: New Sources
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15:20-15:50
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E-beam Metrology in Semiconductor Development
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OhJang Kwon, SK hynix
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15:50-16:20
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16:20-16:40
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Break
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16:40-17:10
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17:10-17:40
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17:40-18:10
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18:10-19:00
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Networking Reception
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(Forum attendees are invited to networking reception.)
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*The agenda will be subject to change without notice.
| Sponsored by |  |
Supported By |  |
