This short course tutorial is designed as basic course for new engineers who is working at etching technology related area. With the practical lecture from device makers, equipment suppliers and academia, you will learn the hottest issues and challenges in plasma & etching process and fundamental technologies as well.
- Date: Feb 1(Thu), 2018
- Time: 09:00-11:45
- Room: #307, Conference Room (South), COEX
- Language: Korean (Simultaneous interpretation will NOT be provided)
Research Trend of Atomic Layer Etching