S2. Advanced Materials & Process Technology

Room 308, COEX Wednesday, January 23
1:00pm to 5:00pm

In this session, we will be able to share the most up-to-date research and development results in the field of Advanced Materials and Process Technology which are the key enablers of the future semiconductor devices. Many prominent authors from the academia and industries will cover various functional materials research area and semiconductor devices not only in the view point of the fundamental but also for the mass production. Especially, topics regarding material innovation for semiconductor application will be highlighted and technical challenges for mass production will be discussed. Excellent 8 presentations including 3 outstanding invited talks will be given and will cover the major technical issues and the leading edge solutions.


  • Date: Jan 23(Wed), 2019
  • Time: 13:00-17:00
  • Room: #308, Conference Room (South), COEX
  • Theme:
  • Language: English (Simultaneous interpretation will NOT be provided)​​
  • Supported by 



  • Si Bum Kim (MagnaChip Semiconductor)
  • DeokSin Kil (SK hynix)
  • Hyoungyoon Kim (DB HiTek)
  • Jae Sung Roh (Jusung Engineering)
  • Kiseon Park (SK Materials)
  • Hyun Chul Sohn (Yonsei University)
  • Gill Lee (Applied Materials)
  • Marco Lee (Lam Research Korea)
  • Jong Min Lee (Eugene Technology)
  • In Gon Lim (Digital Imaging Technology)
  • HanJin Lim (Samsung Electronics)
  • Ji Hyun Choi (Tokyo Electron Korea)


Registration Fee

  SEMI Member Non-Member Student
Early Bird (by Jan 24) 150,000 won 180,000 won 80,000 won
Onsite 180,000 won 200,000 won 100,000 won



     14:40-15:00 Break
    *The agenda will be subject to change without notice.
    * Presentation materials agreed by speaker will be distributed via e-mail after the events.
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