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EUV lithography industrialization progress

EUV lithography industrialization progress

EUV lithography industrialization progress

 

This presentation will provide an overview of the industrialization progress of EUV Lithography, including the latest data on imaging, overlay, defectivity and source power/ productivity.
Field performance data of NXE:3300B, NXE:3350B, and NXE:3400B systems will be shown. In addition, the latest performance development information will be presented.
Furthermore, the ASML EUV roadmap will be shown including high-NA and future 0.33NA system enhancements.

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