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Metrology Capabilities and Requirements for 7/5 nm Logic Manufacturing

Metrology Capabilities and Requirements for 7/5 nm Logic Manufacturing

Metrology Capabilities and Requirements for 7/5 nm Logic Manufacturing

 

This presentation will provide an update to our view of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic technology for foundries. First, we will review of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. We will then update the industry’s progress towards addressing gating technical limits of the most important of these metrology solutions, highlighting key metrology technology gaps requiring industry attention and investment.

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