Ken Maruyama is in charge of EUV resist materials development at the JSR Yokkaichi Research Center in Japan. Since he joined JSR in 2006, he has been working in ArF and EUV lithography materials development for about 11 years with experiences in working in Lawrence Berkeley National Laboratory in the US. He obtained his MS and PhD in Applied Chemistry from Kanagawa University in Japan.
본 연사의 발표는 S1. Advanced Lithography(STS) 에서 볼 수 있습니다.