Junsic Hong, Ph.D., is a Principal Member of Technical Staff at Global Foundries in New York. Dr. Hong joined Global Foundries in 2016 in their Advanced Technology Development Division and led projects in the areas of FEOL and MOL Reactive Ion Etch.
Prior to joining Global Foundries, he was a Senior Engineer at IBM’s Semiconductor Research and Development Center in New York. During his five years there, Dr. Hong worked on FinFET, Gate and Junction Patterning scheme developments. Prior to joining IBM, he was a Process Engineer at LAM Research.
Dr. Hong received his M.S. in Chemical Engineering at Seoul National University and his Ph.D. in Chemical Engineering from Stanford University.
본 연사의 발표는 S4. Plasma Science and Etching Technology(STS) 에서 볼 수 있습니다.