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S1. Advanced Lithography

Wednesday, February 5 | 1:00 pm - 5:10 pm
#307

Remaining Issues of EUV

After more than 30 years of relentless effort to realize it, EUV finally got into the high volume manufacturing stage by leading companies of semiconductor industry. Advanced lithography session of the STS 2020 will provide the best opportunity to discuss and review the status and challenges of this long awaiting technologies under the theme of "Remaining issues of EUV". Prominent figures of the academia and industry will provide the most up-to-date information on the latest progresses of EUV lithography and its remaining challenges on various areas of EUV lithography. Topics will include exposure tools, optics, materials, mask, OPC and processes integration in view from the various sectors and stake holders of EUV lithography technology. The extendibility issues of EUV such as high NA EUV will be touched in the session as well.

 

  • Date: Feb 5(Wed), 2020
  • Time: 1:00 pm -  5:10 pm
  • Room: #307, Conference Room (South), COEX
  • Language: English (Simultaneous interpretation will NOT be provided)​​

 

Committee

  • Shangwon Kim (DB HiTek)
  • Seong-Sue Kim (Samsung Electronics)
  • Hong Seok Kim (SEOUL Engineering)
  • Cheolkyu Bok (Dongjin Semichem)
  • Chang-Nam Ahn (ASML Korea)
  • Hye-Keun Oh (Hanyang University)
  • Changmoon Lim (SK hynix)
  • Jaesung Choi (ASML Korea)

 

Registration Fee

  SEMI Member Non-Member Student
Early Bird (by Jan 29) 150,000 won 180,000 won 80,000 won
Onsite 180,000 won 200,000 won 100,000 won

 

Agenda

Exploring the Limits of Single-expose EUV Patterning

Nelson M. Felix

IBM
1:00 pm - 1:40 pm

Mask Patterning Technology at the Era of EUV HVM

Jin Choi

Samsung Electronics
1:40 pm - 2:00 pm

Overlay Metrology Challenges and Solutions in Advanced Nodes

Yoav Grauer

KLA
2:00 pm - 2:20 pm

Machine Learning Solutions to Strengthen Holistic Lithography

Jun Lang

ASML Brion
2:20 pm - 2:40 pm

Break

2:40 pm - 3:00 pm

EUV Resist

Robert Brainard

SUNY
3:00 pm - 3:40 pm

TBD

3:40 pm - 4:20 pm

EUV Challenges for DRAM Patterning

Taejun You

SK hynix
4:20 pm - 4:40 pm

Long-term EUV imaging strategy (incl. high NA) for DRAM & Logic device

Jo finders

ASML
4:40 pm - 5:10 pm

*The agenda will be subject to change without notice.

 

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