Workforce Development : CMP & Cleaning Tutorial
This tutorial is intended for who interested in lithography technologies and related area. In this tutorial, trends and issues as well as fundamentals of Lithography technologies will be provided from industry experts and academia.
- Date: Feb 6(Thu), 2020
- Time: 9:00 am - 12:00 pm
- Room: #308, 3F, COEX
- Language: Korean (Simultaneous interpretation will NOT be provided)
|Early Bird (by Jan 29)||100,000 won||120,000 won||50,000 won|
|Onsite||120,000 won||150,000 won||80,000 won|
Role and Responsibility of CMP Process in Recent IC Technology
Ji Chul Yang
Q&A / Break
Fundamentals of Cleaning Technology
Prof. Kwangsu Kim
* The agenda will be subject to change without notice.