Workforce Development : CMP & Cleaning Tutorial
This tutorial aims to provide a basic course for new engineers who is working at cleaning & CMP technology related area. With this practical lecture from device makers, material suppliers and academia, we expect you will learn the challenges and fundamental technologies in cleaning & CMP process.
- Date: Feb 6(Thu), 2020
- Time: 9:00 am - 12:00 pm
- Room: #308, 3F, COEX
- Language: Korean (Simultaneous interpretation will NOT be provided)
|Early Bird (by Jan 29)||100,000 won||120,000 won||50,000 won|
|Onsite||120,000 won||150,000 won||80,000 won|
Role and Responsibility of CMP Process in Recent IC Technology
Ji Chul Yang
Q&A / Break
Fundamentals of Cleaning Technology
Prof. Kwangsu Kim
* The agenda will be subject to change without notice.