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Workforce Development : CMP & Cleaning Tutorial

Thursday, February 6 | 9:00 am - 12:00 pm
#308

This tutorial aims to provide a basic course for new engineers who is working at cleaning & CMP technology related area. With this practical lecture from device makers, material suppliers and academia, we expect you will learn the challenges and fundamental technologies in cleaning & CMP process.

 

  • Date: Feb 6(Thu), 2020
  • Time: 9:00 am - 12:00 pm
  • Room: #308, 3F, COEX
  • Language: Korean (Simultaneous interpretation will NOT be provided)​​

 

Registration Fee

  SEMI Member Non-Member Student
Early Bird (by Jan 29) 100,000 won 120,000 won 50,000 won
Onsite 120,000 won 150,000 won 80,000 won

 

Agenda

Role and Responsibility of CMP Process in Recent IC Technology

Ji Chul Yang

SK hynix
9:00 am - 10:15 am

Q&A / Break

10:15 am - 10:30 am

Fundamentals of Cleaning Technology

Prof. Kwangsu Kim

Daelim University College
10:30 am - 11:45 am

Q&A

11:45 am - 12:00 pm

* The agenda will be subject to change without notice.