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Workforce Development : Plasma & Etching Tutorial

Thursday, February 6 | 9:00 am - 12:00 pm
#307

This tutorial is designed as basic course for new engineers who are working at etching technology related area. With the practical lecture from device makers, equipment suppliers and academia, you will learn the hottest issues and challenges in plasma & etching process and fundamental technologies as well.

 

  • Date: Feb 6(Thu), 2020
  • Time: 9:00 am - 12:00 pm
  • Room: #307, 3F, COEX
  • Language: Korean (Simultaneous interpretation will NOT be provided)​​

 

Registration Fee

  SEMI Member Non-Member Student
Early Bird (by Jan 29) 100,000 won 120,000 won 50,000 won
Onsite 120,000 won 150,000 won 80,000 won

 

Agenda

Plasma Basic for Semiconductor Processing

Prof. ShinJae You

Chungnam National University
9:00 am - 9:45 am

Q&A / Break

9:45 am - 10:00 am

Plasma Etch with Precision - Cyclic Etch Process

Yoojin Kim

Lam Research
10:00 am - 10:45 am

Q&A / Break

10:45 am - 11:00 am

Future Technology of Dry Etching

Jong Chul Park

Samsung Electronics
11:00 am - 11:45 am

Q&A

11:45 am - 12:00 pm

* The agenda will be subject to change without notice.