Skip to main content

Workforce Development : Deposition Tutorial

Wednesday, February 5 | 9:00 am - 12:00 pm
#308

This tutorial is designed for who wants to learn basic of deposition technology trends. Especially, Atomic Layer Deposition(ALD) which is the key technology in deposition process will be covered.

 

  • Date: Feb 5(Wed), 2020
  • Time: 9:00 am - 12:00 pm
  • Room: #308, 3F, COEX
  • Language: Korean (Simultaneous interpretation will NOT be provided)​​

 

Registration Fee

  SEMI Member Non-Member Student
Early Bird (by Jan 29) 100,000 won 120,000 won 50,000 won
Onsite 120,000 won 150,000 won 80,000 won

 

Agenda

ALD Fundamentals

Prof. Won-Jun Lee

Sejong University
9:00 am - 9:45 am

Q&A / Break

9:45 am - 10:00 am

ALD Technology and Trends from the Equipment Company Perspective

Wan ki Kim

Lam Research
10:00 am - 10:45 am

Q&A / Break

10:45 am - 11:00 am

Type of Si Precursor Used in the ALD Process and Application in 3D NAND Flash

Seok Min Jeon

SK hynix
11:00 am - 11:45 am

Q&A

11:45 am - 12:00 pm

* The agenda will be subject to change without notice.