[Session 3: Reliability] Quantitative Automated AFM Technologies and Reliability Improvement for Semi Applications
Atomic Force Microscope (AFM) is a powerful instrument in characterizing nanoscale features, but it lacks accuracy and repeatability in measuring absolute dimensions. The primary reasons for this matter are the poor behavior of the piezoelectric tube scanner and the inconsistent tip geometry caused by tip wear. Due to these reliability issues together with complex setting of operating parameters, AFM cannot be widely adopted compared to other microscopes such as optical microscope or scanning electron microscope (SEM).
However, the importance of AFM analysis is growing due to the strong necessity to investigate and characterize innovative nanomaterials. Finding new materials with innovative characteristics in nanoscale have helped guide many industries to grow and the newly found materials have contributed breakthroughs in sectors such as energy, transportation, and life science. Quantitatively characterizing electrical, magnetic, mechanical, and morphological properties of these materials are major concerns for both research and industrial sectors.
In addition, we have developed various and reliable semiconductor AFM solutions to complement existing optical metrologies in process development, production, and defect analysis. I would like to introduce the key AFM technologies that enables such developments and present some of the successful examples of semiconductor metrology.