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S1. Advanced Lithography

2020-02-05 | 오후 1:00 - 오후 5:10
#307

Remaining Issues of EUV

After more than 30 years of relentless effort to realize it, EUV finally got into the high volume manufacturing stage by leading companies of semiconductor industry. Advanced lithography session of the STS 2020 will provide the best opportunity to discuss and review the status and challenges of this long awaiting technologies under the theme of "Remaining issues of EUV". Prominent figures of the academia and industry will provide the most up-to-date information on the latest progresses of EUV lithography and its remaining challenges on various areas of EUV lithography. Topics will include exposure tools, optics, materials, mask, OPC and processes integration in view from the various sectors and stake holders of EUV lithography technology. The extendibility issues of EUV such as high NA EUV will be touched in the session as well.

 

  • 날짜: 2020년 2월 5일(수)
  • 시간: 오후 1:00 - 오후 5:10
  • 장소: 코엑스 3층 307호
  • 언어: 영어 (동시통역은 제공되지 않습니다.)​​

 

Committee

  • Shangwon Kim (DB HiTek)
  • Seong-Sue Kim (Samsung Electronics)
  • Hong Seok Kim (SEOUL Engineering)
  • Young-seop Rah (Tokyo Electron)
  • Cheolkyu Bok (Dongjin Semichem)
  • Chang-Nam Ahn (ASML)
  • Hye-Keun Oh (Hanyang University)
  • Changmoon Lim (SK hynix)
  • Jaesung Choi (ASML)

 

등록비

  SEMI 회원사 비회원사 학생
사전등록 (1/29까지) 150,000 원 180,000 원 80,000 원
현장등록 180,000 원 200,000 원 100,000 원

 

Agenda

Exploring the Limits of Single-expose EUV Patterning (invited)

Nelson Felix

IBM
오후 1:00 - 오후 1:40

Mask Patterning Technology at the Era of EUV HVM

Jin Choi

Samsung Electronics
오후 1:40 - 오후 2:00

Overlay Metrology Challenges and Solutions in Advanced Nodes

Yoav Grauer

KLA
오후 2:00 - 오후 2:20

Machine Learning Solutions to Strengthen Holistic Lithography

Jun Lang

ASML Brion
오후 2:20 - 오후 2:40

Break

오후 2:40 - 오후 3:00

Remaining Issues in EUV Photoresists (invited)

Prof. Robert L. Brainard

SUNY Polytechnic Institute
오후 3:00 - 오후 3:40

Patterning and Integration Challenges Using EUV for Advanced Technology Nodes (invited)

Janko Versluijs

imec
오후 3:40 - 오후 4:20

EUV Challenges for DRAM Patterning

Taejun You

SK hynix
오후 4:20 - 오후 4:40

Imaging in EUV Lithography: Current Status and Future Trends (invited)

Jo Finders

ASML
오후 4:40 - 오후 5:10

* 상기 일정은 사전 안내없이 변경될 수 있습니다.

* 본 프로그램은 발표자료를 출력하여 제공하지 않습니다. 프로그램 종료 후, 연사 동의를 얻은 발표자료의 다운로드 방법을 안내해드립니다. 

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