Patrick Naulleau
Director, Center for X-ray Optics, Lawrence Berkeley National Laboratory (invited)
Patrick Naulleau received his B.S. and M.S. degrees in electrical engineering from the Rochester Institute of Technology, Rochester, NY, in 1991 and 1993, respectively. He received his Ph.D. in electrical engineering from the University of Michigan, Ann Arbor in 1997 specializing in optical signal processing and coherence theory.
In 1997 Dr. Naulleau joined Lawrence Berkeley National Laboratory working on the EUV LLC program building the world’s first EUV scanner. From June 2005 through March 2008, Dr. Naulleau additionally joined the faculty at the University at Albany, SUNY as Associate Professor, also concentrating in the area of EUV lithography.
In April 2010 Dr. Naulleau took the position of Director of the Center for X-ray Optic at Lawrence Berkeley National Laboratory. Dr. Naulleau has over 390 publications, 5 book chapters, and holds 20 Patents. Dr. Naulleau is also a Fellow of both Optica (formerly OSA) and SPIE.