Tetsuro Nakasugi

Tetsuro Nakasugi, Ph.D. joined Kioxia Corp., formerly known as Toshiba Memory Corp., in 1991. Since then, he has been in charge of the research and development of next generation lithography.

During his first 15 years, Nakasugi had been engaged in the development of electron beam direct writing lithography, ArF immersion lithography and extreme ultra violet lithography.  Recently he is working on areas of nanoimprint lithography. His current position is chief specialist for the Process Technology Research & Development Center at Kioxia Corp.

Nakasugi received a MS degree in applied physics from Waseda University, Tokyo, Japan and a Ph.D. degree in information system engineering from Osaka University, Osaka, Japan.  He is a member of The Japan Society of Applied Physics.