Seongbo Shim

Seongbo Shim received B.S. and M.S. degrees in physics from Seoul National University, Seoul, Korea, in 2004 and 2006 respectively, and a Ph.D. from the School of Electrical Engineering, KAIST, Korea, in 2016. Since 2006, he has been with the Semiconductor R&D Center, Samsung Electronics, as a Principal Engineer working on computational lithography (OPC and DFM) and EUV patterning for advanced technologies. He has authored more than 50 papers and 2 books on semiconductor manufacturing (photolithography and OPC) and DFM. He is the holder of 15 patents on lithography and OPC. He was involved in a number of conferences including ASP-DAC, ICCAD, VLSI-SoC, and VLSID as steering/program committee member. His research interests have included mask synthesis (OPC) algorithms, DFM, VLSI CAD for the design-manufacturing interface for emerging technologies, and more recently he is particularly interested in EUV patterning.