Rémi DUSSART

Rémi DUSSART is a professor at Université d’Orléans in France, working at GREMI laboratory. His research interests involve low pressure plasmas, GaN etching, deep Titanium etching, cryoetching processes and microdischarges on silicon devices.

He was involved in a project of cryoetching for low-K material in collaboration with Tokyo Electron (Japan) and IMEC (Belgium) and on on atomic layer cryo-etching with Tokyo Electron.

He was the head of the electrical and optical engineering department from 2011 to 2016 and of the Engineering Physics and Embedded Systems department from 2018 to 2019 at Polytech Orleans (France). He is author or co-author of more than 80 papers in international scientific journals. He took part to the executive international committee of the Plasma Science and Technology Division of the American Vacuum Society from 2008 to 2010. He also joined the committee of EPS/ICPP in 2012. He was chair of the steering committee of the International Colloquium on Plasma Processes in 2011 (CIP-2011) organized by the French Vacuum Society. He also joined the international committee of the Dry Process Symposium organized in Japan. He supervised 17 PhD students, 4 engineers and 12 post-doc. He took part to 62 PhD juries and was one of the referees of 36 thesis manuscripts. He performed 24 invited talks for international conferences.