Yeon Ho Lim

Yeon Ho Im, Ph.D. has been a professor in the School of Semiconductor and Chemical Engineering at Jeonbuk National University since 2005. He has developed a semiconductor plasma process simulator, K-SPEED, which is coupled with plasma bulk simulation and a 3D feature profile with a realistic bulk plasma and surface reaction database. His current research interests are fast and highly reliable plasma process simulation, plasma diagnostic, chemical and biological sensors.

 Prior to joining Jeonbuk National University, Im was a senior engineer in the Memory Division at SAMSUNG. During almost his two years at SAMSUNG, Im spent time developing contact etch processes of DRAM and Flash memory.

 Im received a Ph.D. degree in the plasma etching research field from Jeonbuk National University, Jeonju, Korea. And then, he joined the Center for Gigascale Integration at Rensselaer Polytechnic Institute (USA) as a postdoctoral fellow to develop three dimensional feature scale simulator (PLENTE and EVOLVE) from 2002 to 2003. In 2014, he worked as a visiting scholar at Prof. Graves lab, UC Berkeley (USA) to perform molecular dynamics simulation for plasma etching process.