Eui Sang Park

“Euisang Park”, has been Head of Mask Process position at SK hynix company for 4 years with responsibility all of mask process included DUV and EUV. This position produces masks for DUV and EUV and is responsible for developing EUV masks according to the technology roadmap.

Prior to joining SK hynix Company, “Park” was the leader of future technology position for PCL Company. During his 6 years at PCL Company, “Park” spent time doing responsibility the development of ArF PSM, responsibility the E-beam writer and responsibility the development of future technology.

”Park” received a Ph.D degree in material engineering field from Seoul National University School, Seooul, Republic of Korea and a M.S degree in electronic engineering field from the Kyungpook University School, Daegu, Republic of Korea. The paper “Atomic Layer Deposition of Nanocrystalline-As-Deposited (GeTe)x(Sb2Te3)1–x Films for Endurable Phase Change Memory” was selected as the cover image in the 2019 chemistry of materials journal.