Stefan Decoster

Stefan Decoster holds an M.Sc. degree in physics from KU Leuven, where he also received a PhD degree in physics in 2009 on ion implantation-related lattice damage in semiconductors. After working one year as a post-doctoral researcher at the Australian National University in Canberra, he joined imec in 2012 as an R&D dry etch engineer.

He is specialized in back-end-of-line (BEOL) dry etch processing and advanced multi-patterning and self-aligned patterning approaches, both for dual damascene and for subtractive metal etch schemes.