Ted Liang (invited)

Dr. Ted Liang recently retired from Intel Corporation after nearly 29 years. Before his retirement, Dr. Liang was a Principal Engineer at Intel Mask Operation with responsibilities in the development of mask infrastructure and enabling technologies for EUV lithography. Dr. Liang is a well-recognized expert in the field and has been instrumental in the introduction of several critical EUV mask technologies to the industry. He has initiated and led numerous development and collaboration programs, within Intel and with various materials and equipment suppliers, industry consortia and universities. Dr. Liang’s major contributions to the mask industry include Ru capped Mo-Si multilayer blank as used across the industry today, actinic blank inspection, e-beam mask repair, actinic patterned mask inspection, and EUV pellicles. He has received two Intel Achievement Awards, the company's highest recognition for technical accomplishment. Dr. Liang is an SPIE Fellow, has more than 60 publications, and holds six patents. Dr. Liang earned his Ph.D. in Materials Science and Engineering from the University of Wisconsin at Madison.