Dong-Seok Nam (invited)

Dong-Seok Nam is Principal Application Scientist of ASML, and has been working at ASML for 7 years as a specialist of photomask, especially EUV mask application technology.  

Prior to joining ASML, Mr. Nam was Principal Engineer for Samsung Electronics. During his 22 years at Samsung Electronics, Mr. Nam spent time doing the responsibility of Photolithography process development for 9 years and the responsibility of Photomask development for 13 years after he received a Bachelor’s degree and Master degree in Physics from Kyunghee University and Seoul National University, Seoul, Korea respectively.