Hyo-Chang Lee

“Hyo-Chang Lee”, Ph.D. has been Research Scientist position at Korea Research Institute of Standards and Science (KRISS) since 2016. His research concerns experimental and theoretical studies of the radio-frequency plasmas and development of precise plasma diagnostic tools and new plasma sources.

He received Ph. D degree in electrical engineering from Hanyang university, Seoul, South Korea, in 2012. Prior to joining KRISS, Dr. Lee was a lecture professor, a research professor, and a research fellow at Hanyang University (2012-2015), a visiting researcher at Princeton Plasma Physics Laboratory in Princeton university (2013), and a senior researcher at Etch Technology Team, Memory Division, Samsung Electronics (2015-2016). In 2016, he joined KRISS as a senior research scientist and is currently a distinguished research scientist at KRISS. He is also an adjunct professor at Hanyang University (2019-2021). 

He has published over 80 scientific papers including invited reviews, such as “Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics”, Applied Physics Reviews 5, 011108 (2018). He is members of the American Physical Society, the American Vacuum Society, and the Institute of Electrical and Electronics Engineers (IEEE). He has been an IEEE senior member since 2018. He was the recipient of the 2020 Hershkowitz Early Career Award and Review of Institute of Physics (IOP). He is serving as editorial board of the Plasma Sources Science and Technology journal of IOP.