Nelson Felix

Nelson Felix joined IBM in 2008 and is currently the Senior Manager for Patterning Research. In this role, Dr. Felix is responsible for the demonstration and enablement of new patterning processes and materials to support IBM’s leading-edge CMOS device and AI hardware roadmap. Based at IBM’s research facilities in New York State, this work has heavily leveraged the full capability of EUV technology to drive the scaling and AI roadmap forward.

Dr. Felix received his B.S. from the University of Massachusetts, Amherst (2002) and his Ph.D. from Cornell University (2007), both in chemical engineering, and his doctoral work centered on the characterization of novel photoresist materials. He has over 100 publications with over 1000 citations.