Prof. Robert L. Brainard

Robert Brainard received his B.S. in Chemistry from UC Berkeley. He studied the reaction mechanisms of organoplatinum compounds during his graduate studies with Professor Whitesides at MIT and Harvard University. After receiving his Ph.D., he studied the reaction mechanisms on copper and silver surfaces under ultrahigh-vacuum conditions as a post-doctoral student with Professor Madix at Stanford University.

Robert did product development research while working for Polaroid (3 years) and at Shipley/Rohm & Haas (15 years) in the areas of electrodeposited, dielectric, color filter, DUV, EUV, x-ray, and e-beam photoresists. Robert was the first chemist in the world to design resists for EUVL, starting in 1998 while working at Shipley Co. and in collaboration with the EUV LLC.

Robert is now a tenured Professor at the College of Nanoscale Science and Engineering within SUNY Polytechnic Institute investigating new materials for use in EUVL and biological applications. His specific research interests include:

• EUV photoresist exposure mechanisms
• 193-nm Resist Design and Synthesis
• High-quantum-efficiency EUV photoresists
• Metal Containing EUV Photoresists

Robert finds the opportunity to have fun at work by advising college clubs focused on his two hobbies: rock climbing and playing jazz music.