박상종

SANG JONG PARK has been VP position at PSK Corporation since 2011 with responsibility dry clean team manager and product group leader. Park’s responsibility is to develop “DRY CLEAN” process which is one of the most important processes is removing the native oxide of the contact interface from the semiconductor. Park’s team focuses on selectivity removing native oxide on Si-wafer surface or removing a certain amount of thick oxide film. To optimize this process, various factors are controlled to improve the performance and productivity of the equipment according to customer’s VOCs.

Prior to joining PSK Corporation, Park was team manager for Hyundai Electronics, Hynix Semiconductor and Magnachip Semiconductor. During his 18years, Park spent time going responsibility CVD process engineer, MIM module leader, yield engineering team manager at Hyundai Electronics, Hynix Semiconductor, and Magnachip Semiconductor.

Park received the B.S and M.S degree in material science & engineering from Inha University, Incheon, Korea in 1991 & 1993.