Thorsten Lill

Thorsten Lill works on etch technology development and etch / deposition co-optimization challenges at Lam Research. He holds a Ph.D. in Physics from the Albert Ludwigs University of Freiburg, Germany.

In Freiburg, he studied collisions of C60 fullerenes with crystalline surfaces in ion and laser beam experiments. After his graduate studies, he spent time as a post doc researcher at the Chemistry Department at the Argonne National Laboratory working on sputtered metal cluster experiments with Secondary Neutral Mass Spectrometry with laser post ionization.

He has published over 160 articles and conference papers including first author articles in Physical Review Letters and Science and holds 96 granted patents in the fields of plasma and ion beam sources, plasma etching, Atomic Layer Etching, CVD, reactor design, and diagnostics. He published a textbook on etching of semiconductor devices including atomic layer etching.