Ralph Dammel

Ralph R. Dammel (*April 29, 1954) received a Ph.D. in Chemistry from the J.W. Goethe University in Frankfurt/FRG in 1986. He has worked for EMD Electronics/Merck KGaA or its predecessor organizations in Germany, the US, Hong Kong, and Thailand since then, and is currently employed as Technology Fellow in the CTO Office of Merck KGaA’s Electronics division. 

Dr. Dammel is the author of over 200 scientific papers in chemistry and microlithography and is an inventor on over 500 patents in 110 patent families in the field. His monograph “Diazonaphthoquinone-based Resists” is generally recognized as the definitive book on the subject. In spring 2009, Dr. Dammel was elected as SPIE Fellow. He received the Photopolymer Science and Technology Outstanding Achievement Award in June 2011, SPIE’s Frits Zernicke Award for Microlithography in February 2015, and Merck KGaA’s Science Award in 2020.