Sangjong Park

“Park Sang Jong”, Ph.D. has been SVP position at PSK company for since 2011 with responsibility Dry Cleaning Process, responsibility Hard Mask Strip. Our company’s responsibility is to develop dry cleaning products. Dry Cleaning process is removing the native oxide of the contact interface from the semiconductor is one of the most important procedures. Our core technology focuses on selectively removing native oxide on Si-wafer surface or removing a certain amount of thick oxide film.

Prior to joining PSK Company, “Park” was Chief Engineer position for Hynix Company. During his 11years at Hynix Company “Park” spent time doing responsibility Semiconductor device manufacturing process development.

”Park” received a Master degree in Inorganic Material field from Inha-University.