Jo Finders

Born in 1963 in Kerkrade, the Netherlands, Jo graduated in Physics with MSc in 1987, and PhD in 1991 from Aachen University of Technology, Germany.

Jo Finders received his M.S. and Ph.D. in Physics from Aachen University of Technology, Germany.

From 1991- 1994 he worked as a member of technical staff at the Aachen University of technology on the spectroscopic analysis of artificial diamond layers. 

He joined IMEC in 1994. As a member of the micro patterning group he was active in various fields of optical lithography such as resolution enhancement techniques, CD-control and wafer CD-metrology.

In 1997 he joined ASML where he was responsible as Project leader for stepper applications and later as Project leader for low-k1 imaging in optical lithography.  Currently he is group lead within System Engineering responsible for the EUV imaging technology roadmap.

Jo holds over 45 patents and has (co) authored more than 100 papers is the field of optical lithography.

In June 2006 he was elected as an ASML fellow and in 2019 as a SPIE fellow.