JongCheon Park

Jongcheon Park joined SK hynix in 2008 and is currently working at the Research & Development Division. He has experience in developing DRAM t2y/t1y tech. as well as DSA (Directed Self Assembly) technology, one of lithographic techniques. He is currently involved in developing DRAM t1za tech. along with OPC for EUVL (Extreme Ultra Violet Lithography), the next generation of lithography.