Skip to main content

Download 'Program-at-a-Glance'

Download 'Program Guide Book'

Subsessions

9:00 am

Advanced Semiconductor Packaging Technology : Overview

Prof. Hak-Sung Kim

Hanyang University
9:00 am - 10:15 am

ALD Fundamentals and Recent Advances: From Precursors to Equipment

Prof. Won-Jun Lee

Sejong University
9:00 am - 10:15 am

Fundamentals of Plasma Etching

Prof. Geun Young Yeom

Sungkyunkwan University
9:00 am - 10:15 am

Lithography Process Technology

Jung Sik Kim

SK hynix
9:00 am - 9:50 am

NAND Memory General and Future

Jonghun Kim

SK hynix
9:00 am - 10:15 am

9:30 am

Open Remark (GES key takeaway- Call to Action)

Decarbonization as a Shared Strategic Priority for the Semiconductor Supply Chain

Saifi Usmani

SEMI
9:30 am - 9:40 am

9:40 am

Keynote Speech

Supply Chain Decarbonization

Seongbong Cho

SK hynix
9:40 am - 9:55 am

9:50 am

Q&A / Break

9:50 am - 10:00 am

9:55 am

SCC Baseline Ambition Roadmap (BAR) WG

Developing science-aligned emissions reduction targets for the semiconductor industry

Prannoy Chowdhury

Carbon Trust
9:55 am - 10:15 am

10:00 am

CMP – The Hidden Architect in the Advanced Packaging Era

Kevin Vandersmissen (invited)

imec
10:00 am - 10:40 am

Development Status and Future Prospects of Lithography Equipment

Hyoung-Kook Kim

ASML
10:00 am - 10:50 am

Emergence and Evolution of Advanced Package Materials

Jihye Shim

Samsung Electronics
10:00 am - 10:30 am

Opening Speech

10:00 am - 10:25 am

Welcome

10:00 am - 10:05 am

10:05 am

[Keynote] Physical AI for Dark Factories: Sim-to-Real Orchestration of Heterogeneous Robot Fleets Using Digital Twin Intelligence

Prof. Young Jae Jang (invited)

KAIST
10:05 am - 10:40 am

10:15 am

Q&A / Break

10:15 am - 10:30 am

SCC Scope 1 WG Update

Chris Jones

Edwards
10:15 am - 10:30 am

10:20 am

Beyond ZFLOPS: What's Next?

Architecting the Future of AI Systems

Jaihyuk Song

Samsung Electronics
10:20 am - 10:40 am

10:25 am

1000x More Efficient On-Device AI: Powering AR/VR, Humanoid Robotics, and Beyond

Jaejun Lee

AnalogAI
10:25 am - 10:35 am

10:30 am

Advanced Semiconductor Packaging Technology : Recent Trends

JaeDong Kim

JD Technology
10:30 am - 11:45 am

Epitaxy Engineering in Advanced Semiconductor Devices

Prof. Dae-Hong Ko

Yonsei University
10:30 am - 11:45 am

Etch Challenges and Technology Trends

Huichan Seo

SK hynix
10:30 am - 11:45 am

F-GHG and Abatement Solution

Hak Joon Kim

KIMM
10:30 am - 10:45 am

Overview of Emerging Memory Technologies for Next-Generation Computing

Soo Gil Kim

SK hynix
10:30 am - 11:00 am

Various Reliability Issues in DRAM cell transistors

Junsoo Kim

Samsung Electronics
10:30 am - 11:45 am

10:35 am

From Data Gravity to Data-Centric Intelligence: Redefining the Future of AI Infrastructure

Jin Kim

XCENA
10:35 am - 10:45 am

10:40 am

Advanced Packaging and the Future of System Optimization

Tien Wu

ASE
10:40 am - 11:00 am

CMP for Heterogeneous Integration

Brian Brown

Applied Materials
10:40 am - 11:05 am

[Keynote] Advancing Autonomous Fabs: PM Automation & Standardization Strategy

Youbean Kim (invited)

Myongji University
10:40 am - 11:15 am

10:45 am

3D Semiconductor Nano-Metrology: Quartz Tuning Fork-Based AFM

Wonho Jhe

Multiscale Instruments
10:45 am - 10:55 am

Scope 3 Decarbonization

Driving Decarbonization Through Collaboration

Songyi Song

Samsung Electronics
10:45 am - 11:00 am

10:50 am

Q&A / Break

10:50 am - 11:00 am

10:55 am

Ease on Three-Dimensional Memory and Logic Integration

Jekyung Kim

FS2
10:55 am - 11:05 am

11:00 am

Big Chips, Tiny Chips, and Scaling 3-D System Architectures: A Hybrid Bonding Perspective

Seung Kang

Adeia
11:00 am - 11:30 am

Building Scalable Infrastructure for the AI Factories of Tomorrow: Cadence’s End-to-end Approach

Boyd Phelps

Cadence Design Systems
11:00 am - 11:20 am

Fundamentals of EUV Lithography

Prof. Jinho Ahn

Hanyang University
11:00 am - 11:50 am

Scope 3 Decarbonization

Collaboration and Partnership across the Value Chain

In San Park

SK Siltron
11:00 am - 11:15 am

[Netherlands Tech Pitching Lunch] Registration

11:00 am - 11:30 am

11:05 am

Break

11:05 am - 11:15 am

Break

11:05 am - 11:15 am

11:15 am

Advanced Liquid Cooling Solution for Next Generation AI Semiconductor

Yunhyeok Im

KoolMicro
11:15 am - 11:25 am

Considerations for Realizing Autonomous Manufacturing by AX

KyeungTai Kim

Miracom
11:15 am - 11:40 am

Proactive Yield Maximization in Photolithography via Human-in-the-Loop AI on an On-Premise Big Data Platform

Jeng-Hun Suh

SemiAI
11:15 am - 11:40 am

SCC Scope 2 WG and Energy Collaborative (EC)

So Young Jang

SEMI
11:15 am - 11:25 am

Surface Preparation Challenges in 3D Integration

Philippe Garnier (invited)

STMicroelectronics
11:15 am - 11:55 am

11:20 am

The Velocity Imperative

Tim Archer

Lam Research
11:20 am - 11:40 am

11:25 am

Advanced Powder Coating Tech. for Battery and Semiconductor Industries

Taejoo Park

ALPES
11:25 am - 11:35 am

Networking Break

11:25 am - 11:40 am

11:30 am

Process Control in Advanced Packaging

Yoonjoo Kim

KLA
11:30 am - 12:00 pm

[Netherlands Tech Pitching Lunch] Opening & Greeting

Joo-won Lee

Embassy of the Kingdom of the Netherlands
11:30 am - 11:35 am

11:35 am

SMILE: Next-Gen AI Software for Extreme Yield Improvement in Chip Manufacturing

Taekwon Jee

SemiAI
11:35 am - 11:45 am

[Netherlands Tech Pitching Lunch] Pitching by Dutch Companies

11:35 am - 12:35 pm

11:40 am

Poster Session & SM Reception

11:40 am - 1:30 pm

Renewable Energy Procurement Guideline in the Korea market

Jeongseok Lee

Korea Energy Agency
11:40 am - 1:10 pm

The Inflection Point has arrived: Driving Innovation towards Future of Memory Technology

Sunghoon Lee

SK hynix
11:40 am - 12:00 pm

11:45 am

Q&A

11:45 am - 12:00 pm

Ultrafast CT for HBM Inspection

Keunho Rew

Gaia Vision
11:45 am - 11:55 am

11:50 am

Q&A

11:50 am - 12:00 pm

11:55 am

Break

11:55 am - 12:05 pm

Next-Gen CMP Metrology: Integrated Metrology Innovations for Bonding and Edge Control

Nurit Taub

Nova
11:55 am - 12:20 pm

12:00 pm

AI Supercomputing for Next-Generation Semiconductor Design and Manufacturing

Timothy Costa

NVIDIA
12:00 pm - 12:20 pm

Poster Session & MI Forum Reception

12:00 pm - 2:00 pm

Test Reception

12:00 pm - 1:00 pm

12:05 pm

Advancing Vision with INFRARED-AI™

James Lee

STRATIO
12:05 pm - 12:15 pm

12:15 pm

Fully Parallel Processing Processor

Junbeom Lee

MORUMI
12:15 pm - 12:25 pm

12:20 pm

Overview of Market Trends in the Semiconductor Materials Industry with Focus on CMP Consumables

Andy Tuan

Linx Consulting Inc. / SEMI
12:20 pm - 12:45 pm

12:25 pm

Autonomous Process Control for Advanced Semiconductor Fabs

Seungchoun Choi

Amously
12:25 pm - 12:35 pm

12:35 pm

High-Speed Laser Annealing Equipment Technology for Next-Generation Semiconductor Processes

JeongDo Ryu

RNR LAB

12:35 pm - 12:45 pm

[Netherlands Tech Pitching Lunch] Networking

12:35 pm - 1:00 pm

12:45 pm

Break

12:45 pm - 12:55 pm

Networking Lunch

12:45 pm - 1:30 pm

12:55 pm

Robust O/L Control Limitations Imposed by the CMP Process

Hyeokjung Lee

SK hynix
12:55 pm - 1:20 pm

1:00 pm

Advanced embedded memory technology for generative AI development at the edge

Gouri Sankar Kar (invited)

imec
1:00 pm - 1:40 pm

Break & Registration

1:00 pm - 2:00 pm

Future Advanced Package Solutions for HPC/AI Applications

Hyun Chul Jung

Samsung Electronics
1:00 pm - 1:25 pm

Global Memory Market Outlook

Peter(Seicheol) Lee

Citigroup
1:00 pm - 1:30 pm

High-NA EUV Lithography at the Turning Point: Preparing for Industry Insertion

Geert Vandenberghe

imec
1:00 pm - 1:40 pm

Introduction

1:00 pm - 1:05 pm

SiC and GaN Devices in the Mainstream - Achievements, Challenges and Perspectives

Prof. Nando Kaminski (invited)

University of Bremen
1:00 pm - 1:40 pm

TBD

TBD

1:00 pm - 1:30 pm

Technology & Market Trend in Power Semiconductors

Sooseong Kim

KEC
1:00 pm - 1:30 pm

[Presentations (Moderator: Prof. Yoon-Jong Lee, KAIST)] The Present and Future of K-AI Semiconductors

Prof. Hoi-Jun Yoo

KAIST
1:00 pm - 1:25 pm

The Right Testing Strategy Can Save Designs

Dave Collins

Teradyne
1:00 pm - 1:30 pm

Transformational Plasma Etch Technologies Enabling Ultra Fine Pitch Patterning

Gowri Kamarthy

Lam Research
1:00 pm - 1:25 pm

1:05 pm

Breaking Barriers, Building Careers: A Woman in Semiconductors

Gwen Lee

Lam Research
1:05 pm - 1:20 pm

1:10 pm

Renewable Energy Procurement and Supply Chain Management through Digital Marketplace

Mingi Lim

CnerG
1:10 pm - 1:25 pm

1:20 pm

CE: Beyond Maintenance

Junsu Han

Applied Materials
1:20 pm - 1:35 pm

Challenges and Trends of Dry Clean Process in Semiconductor Technologies

Sunggil Kang

Samsung Electronics
1:20 pm - 1:45 pm

1:25 pm

Closing : Next Steps for Call to Action

So Young Jang

SEMI
1:25 pm - 1:30 pm

Complex Memory Systems for the Agentic AI Era: HBM-HBF-SOCAMM

Prof. Joungho Kim

KAIST
1:25 pm - 1:50 pm

Complex Memory Systems for the Agentic AI Era: HBM-HBF-SOCAMM

1:25 pm - 1:50 pm

Velocity and Precision Advancing Plasma Etching for AI-Driven Scaling

Sang-Jun Choi

Applied Materials
1:25 pm - 1:50 pm

VFO Packaging for High Performance On-Device AI systems

Ki Jun Sung

SK hynix
1:25 pm - 1:50 pm

1:30 pm

Advanced Packaging as a Platform: Enabling the Future Architecture of Semiconductors

Jan Vardaman

TechSearch International
1:30 pm - 2:00 pm

From Reactive to Predictive: AI-Driven Optimization for Automated Test Equipment (ATE) Performance and Reliability

Wai-Kong Chen

Cohu
1:30 pm - 2:00 pm

Manufacturing AI Solutions for Engineering Automation

Ki Chul Yang

BISTelligence
1:30 pm - 1:55 pm

Registration & Networking

1:30 pm - 2:00 pm

The Reduction of Surface Defect of SiC Epitaxy by Improved in-situ Etching Process

Han Seok Seo

Research Institute of Industrial Science & Technology
1:30 pm - 2:00 pm

1:35 pm

Break

1:35 pm - 1:55 pm

1:40 pm

Innovative Techniques for High NA EUV: Achieving Robustness in Patterning

Hongik Kim

SK hynix
1:40 pm - 2:05 pm

Next-Generation 3D-NAND Device and Process Technology

Yoohyun Noh

SK hynix
1:40 pm - 2:05 pm

Technical Challenges for 3D-NAND Extension

Jinho Oh

SK hynix
1:40 pm - 2:05 pm

1:50 pm

Enabling 3D-IC and Advanced Packaging through Plasma Dry Etch Technologies

Jeongsoo Kim (Invited)

imec
1:50 pm - 2:30 pm

From Silicon to Systems: Advanced Packaging enabling AI Performance Scaling

Audrey Charles (invited)

Lam Research
1:50 pm - 2:20 pm

[Presentations (Moderator: Prof. Yoon-Jong Lee, KAIST)] Prospect of Memory Devices in AI Generation

Sun-Ghil Lee

Tokyo Electron Korea
1:50 pm - 2:15 pm

1:55 pm

A New Horizon Made Possible by AI

Selim Nahas (invited)

Applied Materials
1:55 pm - 2:20 pm

Global Customer Engineer

SangSu Jeong

SEMES
1:55 pm - 2:10 pm

2:00 pm

8 inch SiC Epitaxial Technology and Industrial Application

Larkin Kong

Hangzhou Haiqian Semiconductor
2:00 pm - 2:30 pm

AI Propels Semiconductor Industry – What Lies Ahead

Gaurav Gupta

Gartner
2:00 pm - 2:30 pm

AI-powered paradigm shift: Unlocking the Next Wave of Innovation in the Semiconductor Industry

Changho Jin

SK Encore
2:00 pm - 2:30 pm

Applications of High Speed IR and Micro-Bump Metrology for Advanced Packaging of Advanced Memory and Logic Devices

Yu Figer

Onto Innovation
2:00 pm - 2:30 pm

Break

2:00 pm - 2:20 pm

CMP Fundamentals for 3D Integration

Prof. Taesung Kim

Sungkyunkwan University
2:00 pm - 3:15 pm

Opening

Yoshio Kondo

TXOne Networks
2:00 pm - 2:05 pm

Opening Remarks

Andrew Gately

U.S. Embassy Seoul
2:00 pm - 2:05 pm

Regulatory Response Strategies from the Viewpoint of Customer Needs

Hyuk Hwa Kwon

SK hynix
2:00 pm - 2:25 pm

[Session 1: Semiconductor Ecosystem in the Netherlands and Korea] Opening & Greeting

2:00 pm - 2:05 pm

2:05 pm

Break

2:05 pm - 2:25 pm

Break

2:05 pm - 2:25 pm

Break

2:05 pm - 2:25 pm

Market Overview and U.S. Investment Climate

Donghwan Lee

Boston Consulting Group
2:05 pm - 2:35 pm

[Keynote] Proactive Security Response: Mitigating Supply Chain Security Risks through Practical Drills

Yongpil Lee

Korea Internet & Security Agency (KISA)
2:05 pm - 2:30 pm

[Session 1: Semiconductor Ecosystem in the Netherlands and Korea] Congratulatory Remark

Aukje de Vries

Minister for Foreign Trade and Development

Jong Myeong Lee

Samsung Electronics
2:05 pm - 2:10 pm

2:10 pm

A Day in the Life of a Process Engineer

Sangheon Yong

ASM
2:10 pm - 2:25 pm

[Session 1: Semiconductor Ecosystem in the Netherlands and Korea] Dutch Semiconductor Ecosystem

Naomie Verstraeten

Brainport Development
2:10 pm - 2:20 pm

2:15 pm

Break

2:15 pm - 2:25 pm

2:20 pm

Break

2:20 pm - 2:40 pm

Intelligent ALD—Real-Time Prediction, Anomaly Detection, and Recipe Optimization

Jeff Kim

SurplusGLOBAL
2:20 pm - 2:45 pm

MPDU (Modular Power Delivery Unit) – Intel System Level Test Platform Power Delivery Solution tailored for Manufacturing Test Environment

Syed Hussein SYED ALWI

Intel
2:20 pm - 2:50 pm

[Session 1: Semiconductor Ecosystem in the Netherlands and Korea] Status of Korea Semiconductor Industry

Jaemin Jun

Korea Semiconductor Industry Association
2:20 pm - 2:30 pm

2:25 pm

Accelerating Semiconductor Roadmaps: The Role of AI-Driven

Ron Pearlstein

Merck
2:25 pm - 2:50 pm

Embedded Memory for Future Edge Computing

François Andrieu (invited)

CEA-Leti
2:25 pm - 3:05 pm

[Presentations (Moderator: Prof. Yoon-Jong Lee, KAIST)] From Chip War to AI War

Seung-Woo Lee

Eugene Investment & Securities
2:25 pm - 2:50 pm

Overview of SEMI EHS Regulatory Efforts

James Amano

SEMI
2:25 pm - 2:50 pm

Speak Up, Step First

Taeyang Yang

Advantest
2:25 pm - 2:40 pm

The Evolution of EUV Resists and Semiconductor Scaling: A Technical Retrospective and Future Outlook

Ken Maruyama

JSR Corporation
2:25 pm - 2:50 pm

2:30 pm

Break

2:30 pm - 2:50 pm

Break

2:30 pm - 2:50 pm

Current Status of Ga₂O₃ Single Crystal Growth Technology for Next-Generation Power Semiconductor Applications

Jinki Kang

AXEL
2:30 pm - 3:00 pm

Nano Topography Technologies for the Mass Production of Hybrid Bonding Process

Joonho You

Nexensor
2:30 pm - 3:00 pm

[Keynote] Supply Chain Integrity: A Fabless Manufacturing Perspective

Dan O'Loughlin

Qualcomm
2:30 pm - 2:55 pm

[Session 1: Semiconductor Ecosystem in the Netherlands and Korea] Q&A

2:30 pm - 2:35 pm

2:35 pm

Indiana: Semiconductor Ecosystem

Julie Kim

Indiana Economic Development Corporation
2:35 pm - 2:45 pm

[Session 2: EUV Technologies and Metrology] EUV Developmets in ASML

Roderik Van Es

ASML
2:35 pm - 2:45 pm

2:40 pm

Architecting the AI Era: Advanced Packaging as a Strategic Enabler

Mike Chudzik (invited)

Applied Materials
2:40 pm - 3:10 pm

Break

2:40 pm - 3:00 pm

2:45 pm

Break

2:45 pm - 3:05 pm

Williamson County, The Future of High Tech in Texas

Dave Porter

Williamson County Economic Development
2:45 pm - 2:55 pm

[Session 2: EUV Technologies and Metrology] EUV and Metrology Development in TNO

Helen Kardan

TNO
2:45 pm - 2:55 pm

2:50 pm

Architecting Epitaxial Precision for Advanced Node Scaling

Yi-Chiau Huang

Applied Materials
2:50 pm - 3:15 pm

Break

2:50 pm - 3:10 pm

Design-Aware Post-Si Data Analysis Methodology: Links with DFT Design, ATE Test and FA works

Jeongsu Park

Synopsys
2:50 pm - 3:20 pm

Domain Knowledge-Driven Fusion Machine Learning for Overlay Prediction Enhancement

Taekwon Jee

SemiAI
2:50 pm - 3:15 pm

[Presentations (Moderator: Prof. Yoon-Jong Lee, KAIST)] Memory Reimagined: From High-Bandwidth to In-Memory Processing

Kyomin Sohn

Samsung Electronics
2:50 pm - 3:15 pm

Next-Generation Etch Chemistry for the AI Era: Performance & Sustainability Enabled by Merck’s End-to-End Innovation

Sung-Ho Kim

Merck
2:50 pm - 3:15 pm

The AI Data Center Boom: Facts, Fundamentals, and Implications for the Semiconductor Industry

Donghwan Lee

Boston Consulting Group
2:50 pm - 3:20 pm

2:55 pm

Ohio's Burgeoning Semiconductor & Microelectronics Ecosystem

Justin Kocher

JobsOhio
2:55 pm - 3:05 pm

Semiconductor Manufacturing Cybersecurity Consortium (SMCC) Overview

Kimberly Daich

PDF Solutions
2:55 pm - 3:20 pm

[Session 2: EUV Technologies and Metrology] Developing EUV Mask Metrology for High-Volume Manufacturing

Byung Gook Kim

ESOL
2:55 pm - 3:05 pm

3:00 pm

Break

3:00 pm - 3:10 pm

From Dimensions to Properties: Novel Approaching of E-Beam Technology

Keiichiro Hitomi

Hitachi High-Tech
3:00 pm - 3:30 pm

What Do Process Engineers Do in Practice?

Changhyeon Lee

Tokyo Electron Korea
3:00 pm - 3:15 pm

3:05 pm

3D NAND Flash Evolution: Challenges and Opportunities for the Future

Sangyong Park

Samsung Electronics
3:05 pm - 3:35 pm

AI-Empowered Digital Twin for Multi-FAB Simulation

Prof. Sang Chul Park (invited)

Ajou University
3:05 pm - 3:30 pm

New Jersey at the Forefront of Innovation

Bill Noonan (video recording)

Choose New Jersey
3:05 pm - 3:15 pm

[Session 2: EUV Technologies and Metrology] Semiconductor / EUV Lithography and Related MI technology, Synchrotron Science

Sangsul Lee

Postech/Xavis Optics
3:05 pm - 3:15 pm

3:10 pm

Advanced Packaging Market & Technology Trends - Focus on Glass

Bilal Hachemi (video recording)

Yole Group
3:10 pm - 3:35 pm

High Power Semiconductor Markets and Evaluation Method

Hyemin Kang

Korea Institute of Energy Technology(KENTECH)
3:10 pm - 3:40 pm

The Latest Development on POPs and K-REACH

Seongmi Kim

Merck
3:10 pm - 3:35 pm

3:15 pm

Applications of Ion Implantation Technology for Scaling Down Advanced Devices

KyungWon Lee

Axcelis Technologies
3:15 pm - 3:40 pm

Environmentally Sustainable Plasma Etching of SiO2 using Fluorinated Ethers with Low Global Warming Potentials

Prof. Chang-Koo Kim (invited)

Ajou University
3:15 pm - 3:45 pm

High Throughput Digital Lithography Development Enables AI and HPC Device Integration

Ksenija Varga

EV Group
3:15 pm - 3:40 pm

Q&A

3:15 pm - 3:20 pm

Q&A / Break

3:15 pm - 3:30 pm

Tennessee’s Semiconductor Supply Chain Advantage

Hee-jung Shin

State of Tennessee Korea Office
3:15 pm - 3:25 pm

[Presentations (Moderator: Prof. Yoon-Jong Lee, KAIST)] The Role of Semiconductor Packaging in the AI Era: Innovations in Advanced Packaging Technologies Accelerating the AI Era

Kangwook Lee

SK hynix
3:15 pm - 3:40 pm

Working Globally!

Kyungmin Kim

KLA
3:15 pm - 3:30 pm

3:20 pm

Break

3:20 pm - 3:40 pm

Coffee Break

3:20 pm - 3:30 pm

SEMI Market Outlook - Semiconductor Equipment Forecasts, Fab Investment and Material Market Outlook

Clark Tseng

SEMI
3:20 pm - 3:50 pm

SMCC WG9: Expanding Cybersecurity Collaboration in South Korea & Standardized Semiconductor Cyber Assessment (SSCA): A Unified Approach to Supply Chain Security

Suk Won Kang

Applied Materials
3:20 pm - 3:45 pm

TBD

Rich Ashooh

Lam Research
3:20 pm - 3:50 pm

3:25 pm

Key Considerations for U.S. Investment Visa Applications by Korean Semiconductor Companies

Tong-chan Shin

Yulchon LLC

Wook Seon Hong

Yulchon LLC
3:25 pm - 3:35 pm

TBD

Rich Ashooh

Lam Research
3:25 pm - 3:45 pm

3:30 pm

Break

3:30 pm - 3:40 pm

Break

3:30 pm - 3:50 pm

Run-to-Run Control Automation in CMP Enabled by a Production-Oriented Digital Twin

Seungchoun Choi

Amously
3:30 pm - 3:55 pm

Understanding of Particle Removal and Surface Preparation for 3D Integration Era

Prof. Tae-Gon Kim

Hanyang University
3:30 pm - 4:45 pm

[Session 3: Material & Equipment Development] Opportunities for Cooperation in the SoBuJang Field of Semiconductors

Hakkyung Sung

SoBuJang Technology Collaboration Forum
3:30 pm - 3:40 pm

3:35 pm

Atomic Layer Deposition Processes for Future Extremely Scaled Semiconductor Devices

Chang-Yong Nam (invited)

Brookhaven National Laboratory
3:35 pm - 4:15 pm

Break

3:35 pm - 3:55 pm

Challenges of Energy Policy in Korea from the Perspective of Industrial Competitiveness

Prof. Sangjun Lee

Seoul National University of Science and Technology
3:35 pm - 4:00 pm

Networking

3:35 pm - 4:00 pm

3:40 pm

Accurate Transient Current Measurement for AI Processor Power Characterization

Justin(Jeong-Tae) Kim

Keysight Technologies
3:40 pm - 4:10 am

Break

3:40 pm - 4:00 pm

Break

3:40 pm - 4:00 pm

Break

3:40 pm - 3:50 pm

Panel Discussion

Moderator: Hyejin Lee, Tokyo Electron Korea
3:40 pm - 4:40 pm

SiC Ion Implantation Technology

Won-ju Jeong

Nissin Ion Korea
3:40 pm - 4:10 pm

[Session 3: Material & Equipment Development] Introduction of LGE PRI (Semiconductor Equipment)

Joo Won Lee

LG Electronics PRI
3:40 pm - 3:50 pm

3:45 pm

Break

3:45 pm - 4:10 pm

Integrative HARC Etching to Overcome Scaling Limits and Beyond

Sang Wook Park

SK hynix
3:45 pm - 4:10 pm

3:50 pm

Advanced Optical Metrology Solutions for AI Packaging Processes

Fabian Schneider

Nova
3:50 pm - 4:20 pm

[Panel Discussion] Current Status and Outlook of AI and AI Semiconductor Technologies

Moderator: Prof. Wooyeong Cho | KAIST

Prof. Hoi-Jun Yoo

KAIST

Prof. Joungho Kim

KAIST

Sun-Ghil Lee

Tokyo Electron Korea

Seung-Woo Lee

Eugene Investment & Securities

Kyomin Sohn

Samsung Electronics

Kangwook Lee

SK hynix
3:50 pm - 5:00 pm

[Session 3: Material & Equipment Development] Success factors for Contract Engineering; a Dutch perspective

Sven Pekelder

Settels Savenije
3:50 pm - 4:00 pm

3:55 pm

Advanced memory technologies for AI

Gouri Sankar Kar (invited)

imec
3:55 pm - 4:35 pm

Reliable Digital Twins in Manufacturing for Robust and Uncertainty-Aware Prediction of Critical-to-Quality Parameters

Steven Eulig

Merck

Gianni Klesse

Merck
3:55 pm - 4:20 pm

4:00 pm

Advanced Logic Patterning Process for High-NA Lithography

Heeyoung Koh

Samsung Electronics
4:00 pm - 4:25 pm

Challenges and Innovations in Advanced Interconnect Metallization

Juhyun Kim

Samsung Electronics
4:00 pm - 4:25 pm

[Session 3: Material & Equipment Development] Horizontal Integration Partner for Semiconductor Equipment Development

Dongha Kim

Prodrive Technologies
4:00 pm - 4:10 pm

4:05 pm

TBD

TBD

TBD
4:05 pm - 4:30 pm

4:10 pm

Addressing Semiconductor Cybersecurity Challenges through Robust Industry Standards and Globally Secure Frameworks

Alan Weber

PDF Solutions
4:10 pm - 4:35 pm

Break

4:10 pm - 4:30 pm

Evolving Test Distribution in the Age of AI

Fabio Pizza

Advantest Europe
4:10 pm - 4:40 pm

Performance of Tunable Epi System (for SiC, GaN HEMT)

Dong Sik Suh

TES
4:10 pm - 4:40 pm

[Session 3: Material & Equipment Development] Predicting Device-Relevant Properties in ALD and ALE via Multiscale Surface-to-Device Simulation

Fedor Goumans

Software for Chemistry & Materials
4:10 pm - 4:20 pm

4:15 pm

Break

4:15 pm - 4:35 pm

4:20 pm

Break

4:20 pm - 4:40 pm

In-Line 3D SEM Metrology Data for 3D Technology Inflections in Memory, Adv. Packaging and Logic Fabs

Nimrod Shuall

Thermo Fisher Scientific
4:20 pm - 4:50 pm

[Session 3: Material & Equipment Development] Q&A

4:20 pm - 4:25 pm

4:25 pm

Engineering Capacitance Reduction in Advanced Logic and Memory Technology

Erik A Edelberg

Lam Research
4:25 pm - 4:50 pm

High NA EUV for High Volume Manufacturing

Herman Heijmerikx

ASML
4:25 pm - 4:50 pm

[Session 4: New Device] Status for DBH SiC/GaN Technology development

Sang Gi Lee

DB Hitek
4:25 pm - 4:35 pm

4:30 pm

VNAND HARC Etching’s Yesterday, Today, and Tomorrow

Hoki Lee

Samsung Electronics
4:30 pm - 4:55 pm

4:35 pm

Advanced Interconnects Enabling 2.5D and 3D Packaging

Ravi Pokhrel

Qnity Electronics
4:35 pm - 5:00 pm

Next Generation DRAM with Oxide Semiconductor (IGZO) and Cell Structure

Min Hee Cho

Samsung Electronics
4:35 pm - 5:00 pm

TBD

TBD

TBD
4:35 pm - 4:55 pm

Three Foundational Security Strategies for a Sustainable Semiconductor Industry: Training, Encryption, and Backup

Bongho Kang

Fasoo
4:35 pm - 5:00 pm

[Session 4: New Device] Photonics Integrated Circuit

Dongjae Shin

imec Netherlands
4:35 pm - 4:45 pm

4:40 pm

Enabling Agentic AI for Semiconductor Testing

Tony Altinis

NVIDIA
4:40 pm - 5:10 pm

The Future of Fabs – Human ingenuity meets AI speed and robotic precision

Andrew Yoo (invited)

Lam Research
4:40 pm - 5:05 pm

4:45 pm

Q&A

4:45 pm - 5:00 pm

Q&A

4:45 pm - 4:50 pm

4:50 pm

Advanced Logic Technology as a Backbone of the New Era of Computing

Kisik Choi (Invited)

IBM
4:50 pm - 5:30 pm

Closing & Networking

4:50 pm - 5:00 pm

Leveraging Hardware Enabled AI Image Analysis for Rapid 3D X-ray Inspection

Joscha Malin

Comet AG
4:50 pm - 5:20 pm

Navigating Overlay Metrology Challenges: High-NA Lithography, Backside Bonding, Advanced Packaging, and the Road to Massive Sampling

Nadav Gutman

KLA Corporate
4:50 pm - 5:15 pm

4:55 pm

Non-Sinusoidal-Waveform for High Aspect Ratio Etching

Dong-Hun Kim

SEMES
4:55 pm - 5:20 pm

5:00 pm

Advancing Materials and Integration Technologies for Next-Generation Ferroelectric Devices

Ganesh Panaman

Intermolecular
5:00 pm - 5:25 pm

Plasma-free Hydrophilic Bonding for Wafer to Wafer and Die to Wafer 3D and Photonic Applications

Frank Fournel

CEA LETI
5:00 pm - 5:25 pm

Proven Best Path to Secure Resilient Semiconductor Manufacturing in the Era of AI

Toru Takahashi

TXOne Networks
5:00 pm - 5:25 pm

5:05 pm

Industrial Autonomy in the Era of Physical AI: Building the Autonomous Fab Stack

Jonghwan Lee (invited)

NVIDIA
5:05 pm - 5:30 pm

5:20 pm

3D Nanopatterning Using Ion Beam Etching

Denis Joschko

scia Systems GmbH
5:20 pm - 5:45 pm

5:25 pm

Closing

5:25 pm - 5:30 pm

EVG LayerRelease Technology ; Key Innovations in Carrier Systems: Addressing D2W and W2W Stacking Requirements

Thomas Uhrmann

EV Group
5:25 pm - 5:50 pm

Wednesday, February 11, 2026

9:00 am

T1. Lithography Tutorial

Wednesday, February 11 | 9:00 am - 12:00 pm
#307

T2. Deposition Tutorial

Wednesday, February 11 | 9:00 am - 12:00 pm
#308

T3. Device Tutorial

Wednesday, February 11 | 9:00 am - 12:00 pm
#317

10:20 am

Keynote Speech #1

Wednesday, February 11 | 10:20 am - 10:40 am
Auditorium, 3F, COEX

10:40 am

Keynote Speech #2

Wednesday, February 11 | 10:40 am - 11:00 am
Auditorium, 3F, COEX

11:00 am

Keynote Speech #3

Wednesday, February 11 | 11:00 am - 11:20 am
Auditorium, 3F, COEX

11:20 am

Keynote Speech #4

Wednesday, February 11 | 11:20 am - 11:40 am
Auditorium, 3F, COEX

11:40 am

Keynote Speech #5

Wednesday, February 11 | 11:40 am - 12:00 pm
Auditorium, 3F, COEX

12:00 pm

Keynote Speech #6

Wednesday, February 11 | 12:00 pm - 12:20 pm
Auditorium, 3F, COEX

Test Forum

Wednesday, February 11 | 12:00 pm - 5:10 pm
#301

1:00 pm

AI Summit

Wednesday, February 11 | 1:00 pm - 5:00 pm
#401

Compound Power Semiconductor Summit

Wednesday, February 11 | 1:00 pm - 4:40 pm
#403

Market Trends Forum

Wednesday, February 11 | 1:00 pm - 3:50 pm
#402

S1. Advanced Lithography

Wednesday, February 11 | 1:00 pm - 5:15 pm
#307

S2. Advanced Materials & Process Technology

Wednesday, February 11 | 1:00 pm - 5:30 pm
#308

S3. Device Technology

Wednesday, February 11 | 1:00 pm - 5:25 pm
#317

1:30 pm

US Investment Forum

Wednesday, February 11 | 1:30 pm - 4:00 pm
#327

2:00 pm

Cybersecurity Forum

Wednesday, February 11 | 2:00 pm - 5:30 pm
#318

Thursday, February 12, 2026

9:00 am

T4. Plasma & Etching Tutorial

Thursday, February 12 | 9:00 am - 12:00 pm
#307

T6. Packaging Tutorial

Thursday, February 12 | 9:00 am - 12:00 pm
#317

10:00 am

MI (Metrology & Inspection) Forum

Thursday, February 12 | 10:00 am - 5:20 pm
#402

S5. CMP & Cleaning Technology

Thursday, February 12 | 10:00 am - 1:45 pm
#308

Smart Manufacturing Forum

Thursday, February 12 | 10:00 am - 5:30 pm
#327

Startup Summit

Thursday, February 12 | 10:00 am - 1:30 pm
#301

1:00 pm

Meet the Experts!

Thursday, February 12 | 1:00 pm - 4:40 pm
#401

Netherlands-Korea Semiconductor Tech Seminar

Thursday, February 12 | 1:00 pm - 5:00 pm
#318

S4. Plasma Science & Etching Technology

Thursday, February 12 | 1:00 pm - 5:45 pm
#307

S6. Advanced Packaging

Thursday, February 12 | 1:00 pm - 5:50 pm
#317

2:00 pm

Global Semiconductor Regulatory Outlook Forum

Thursday, February 12 | 2:00 pm - 4:00 pm
#328

T5. CMP & Cleaning Tutorial

Thursday, February 12 | 2:00 pm - 5:00 pm
#308

Friday, February 13, 2026

9:30 am

SCC (Semiconductor Climate Consortium) & EC (Energy Collaborative) Forum

Friday, February 13 | 9:30 am - 1:30 pm
#327